Chemical vapor deposition for few‐layer two‐dimensional materials
نویسندگان
چکیده
Chemical vapor deposition (CVD) approach offers a controllable strategy for preparing large-area and high-quality few-layer (mainly bilayer or trilayer) twisted untwisted two-dimensional (2D) materials, is predicted to boost the development of 2D materials from laboratory research industrial applications.
منابع مشابه
Air - gap sacrificial materials by initiated chemical vapor deposition
P(neopentyl methacrylate-co-ethylene glycol dimethacrylate) copolymer, abbreviated as P(npMAco-EGDA), was selected as the potential air-gap sacrificial material among possible combination of twenty monomers and four crosslinkers. P(npMA-co-EGDA) was deposited onto substrates using initiated chemical vapor deposition (iCVD) technique. Spectroscopic data showed the effective incorporation of both...
متن کاملSpatially controllable chemical vapor deposition
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
متن کاملPlasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...
متن کاملAdvanced Computational Modeling for Growing III-V Materials in a High-Pressure Chemical Vapor-Deposition Reactor
A numerical model was developed to simulate vapor deposition in high-pressure chemical vapor-deposition reactors, under different conditions of pressure, temperature, and flow rates. The model solved for steady-state gas-phase and heterogeneous chemical kinetic equations coupled with fluid dynamic equations within a three-dimensional grid simulating the actual reactor. The study was applied to ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: SmartMat
سال: 2023
ISSN: ['2766-8525', '2688-819X']
DOI: https://doi.org/10.1002/smm2.1177